Rhazer®system technology is a breakthrough dry cleaning process for the non-invasive, through pellicle removal of haze contamination from advanced photomasks. Rhazer® equipment is specifically designed for dedicated operation in the wafer fab to fast-turn haze contaminated reticles from the lithography line avoiding the time consuming return to the mask shop and the CD performance degradation often caused by repeated wet clean processes.
After an extensive in-fab evaluation of the Rhazer® haze removal technology, RAVE's new customer determined the Rhazer® process demonstrated the potential to bring significant value to their lithography operations. This resulted in the placement of a multi-system order to RAVE LLC for the Rhazer® tools. The first system has already been installed and accepted with additional systems scheduled for delivery later this year.
RAVE CEO, Barry Hopkins, stated "Our Rhazer® tools have been operating with great success for some time in world-class device foundries. We are very pleased to have the Rhazer® technology selected for use by one of the semiconductor industries larger high-volume device manufacturers. This collaborative effort continues to validate the significant cost and value contribution potential RAVE LLC products bring to our customers."
About RAVE LLC
RAVE LLC is a global supplier of advanced process solutions to the Semiconductor and Photomask industries. Since 2000, RAVE has been recognized as a leading-edge production equipment supplier. RAVE LLC is headquartered in Delray Beach, Florida, USA and maintains sales and service offices in Asia, Europe and the USA. All product and service names are trademarks or registered trademarks.
This press release contains forward-looking statements. The Companies undertake no obligation to update the forward-looking statements contained herein to reflect events or circumstances after the date hereof or to reflect the occurrence of unanticipated events.