Dr. Constantine graduated Magna Cum Laude with a B.S. in Chemistry from FordhamUniversity in New York, completing a Ph.D. in Physical Chemistry from the CityUniversity of New York and an M.B.A. from the Wharton School of Business.
Chris has worked within the Photomask, Semiconductor and Solar industries for the past 20+ years. He joins RAVE from his previous position as Director of New Technologies within the Solar Segment of Oerlikon Corporation. Other important positions he has held include Chief Technical Officer for the Oerlikon Wafer Process Group and President of Oerlikon USA, Chief Technical Officer at Unaxis USA and Principal Scientist at Plasma-Therm Corporation. Prior to working in the Semiconductor Industry, Chris served as a US Naval Officer in various leadership roles.
Dr. Constantine has 38 Refereed Publications and holds 4 patents, all within the Photomask, Silicon and Compound Semiconductor sciences. Chris has also been recognized by the Photomask Industry with the highly prestigious BACUS Technology Award for developing and commercializing Inductively Coupled Plasma (ICP) dry etch systems for advanced photomask manufacture. Chris lead the research team that pioneered the first commercial ICP dry etch system. His accomplishments resulted in what is now the industry standard for mask dry etching that paved the way for the mask industry to keep pace with the ever shrinking demands of semiconductor lithography.
RAVE LLC CEO, Barry Hopkins stated, "We are delighted to have Dr. Constantine join our Senior Management Team. With his extraordinary technical expertise and managerial experience, Chris is a perfect fit to oversee the operations of our combined high technology divisions. We expect Chris to be a key asset and major contributor as we expand and move the company into the future."
About RAVE LLC
RAVE LLC is a global supplier of advanced process solutions to the Semiconductor and Photomask making industries. Since 2000, RAVE has been recognized as a leading-edge manufacturing equipment supplier. RAVE recently introduced its Merlin® mask repair system, focused on 22 nanometer photomask manufacturing and the new Rhazer® haze removal system capable of through-pellicle removal of photo-induced defects in the wafer fab. These latest product lines provide critical process technology expected to bring enormous cost savings and technical benefits to advanced mask and semiconductor manufacturers around the world. RAVE LLC is headquartered in Delray Beach, Florida, USA and maintains sales and service offices in Asia, Europe and the USA. All product and service names are trademarks or registered trademarks.
This press release contains forward-looking statements. The Companies undertake no obligation to update the forward-looking statements contained herein to reflect events or circumstances after the date hereof or to reflect the occurrence of unanticipated events.